Method of manufacturing a facet-free source/drain epitaxial structure having an amorphous or polycrystalline layer

ABSTRACT

The present disclosure is directed to source/drain (S/D) epitaxial structures with enlarged top surfaces. In some embodiments, the S/D epitaxial structures include a first crystalline epitaxial layer comprising facets; a non-crystalline epitaxial layer on the first crystalline layer; and a second crystalline epitaxial layer on the non-crystalline epitaxial layer, where the second crystalline epitaxial layer is substantially facet-free.

BACKGROUND

The source and drain contact resistance in fin-based field effecttransistors can be inversely proportional to the interfacial areabetween the source/drain contacts and underlying epitaxial layers of thesource/drain terminals. In other words, the smaller the interfacial areabetween the source/drain contacts and the underlying source/drainepitaxial layers, the higher the source/drain contact resistance.Epitaxial layer growth on a fin can be based on a crystallographicorientation of the fin's surfaces such that epitaxially-grownsource/drain regions may result in a top surface with limited surfacearea for the source/drain contacts.

BRIEF DESCRIPTION OF THE DRAWINGS

Aspects of the present disclosure are best understood from the followingdetailed description when read with the accompanying figures. It isnoted that, in accordance with common practice in the industry, variousfeatures are not drawn to scale. In fact, the dimensions of the variousfeatures may be arbitrarily increased or reduced for clarity ofdiscussion.

FIG. 1 is an isometric view of a three-fin FET structure withsource/drain epitaxial structures having an enlarged top surface, inaccordance with some embodiments.

FIG. 2 is a flowchart of a method for forming source/drain epitaxialstacks with an enlarged top surface, in accordance with someembodiments.

FIGS. 3A-4C are cross-sectional views of a fabrication sequence forforming source/drain epitaxial stacks with an enlarged top surface, inaccordance with some embodiments.

FIGS. 5A and 5B are cross-sectional views of a fabrication sequence forforming source/drain epitaxial stacks with an enlarged top surface, inaccordance with some embodiments.

FIG. 6 is a cross-sectional view of source/drain epitaxial stacks withan enlarged top surface, in accordance with some embodiments.

DETAILED DESCRIPTION

The following disclosure provides different embodiments, or examples,for implementing different features of the provided subject matter.Specific examples of components and arrangements are described below tosimplify the present disclosure. These are, of course, merely examplesand are not intended to be limiting. For example, the formation of afirst feature on a second feature in the description that follows mayinclude embodiments in which the first and second features are formed indirect contact, and may also include embodiments in which additionalfeatures may be formed that are between the first and second features,such that the first and second features are not in direct contact.

Further, spatially relative terms, such as “beneath,” “below,” “lower,”“above,” “upper,” and the like, may be used herein for ease ofdescription to describe one element or feature's relationship to anotherelement(s) or feature(s) as illustrated in the figures. The spatiallyrelative terms are intended to encompass different orientations of thedevice in use or operation in addition to the orientation depicted inthe figures. The apparatus may be otherwise oriented (rotated 90 degreesor at other orientations) and the spatially relative descriptors usedherein may likewise be interpreted accordingly.

The term “nominal” as used herein refers to a desired, or target, valueof a characteristic or parameter for a component or a process operation,set during the design phase of a product or a process, together with arange of values above and/or below the desired value. The range ofvalues is typically due to slight variations in manufacturing processesor tolerances.

In some embodiments, the terms “about” and “substantially” can indicatea value of a given quantity that varies within 5% of the value (e.g.,±1%, ±2%, ±3%, ±4%, ±5% of the value).

The term “vertical,” as used herein, means nominally perpendicular tothe surface of a substrate.

In fin-based field effect transistors (e.g., finFETs), epitaxial layersof the source/drain (S/D) terminals are grown on crystalline fins formedon a substrate. Consequently, contacts for the S/D terminals can beformed by forming a conductive structure (e.g., a S/D contact) on thetop surface of the S/D epitaxial layers. The resistance of the S/Dcontact can be reduced if the contact area between the bottom of the S/Dcontact and the top surface of the S/D epitaxial layers is as large aspossible. Achieving a large contact area between the bottom of the S/Dcontact and the top surface of the S/D epitaxial layers can bechallenging. For example, during the S/D epitaxial layer deposition,some silicon crystallographic orientations favor (or promote) theepitaxial layer growth more than others. This can result to a finalepitaxial structure that has a “diamond” shape with facets parallel tothe {111} silicon crystal planes. The diamond shaped S/D epitaxial stackhas an edge-like structure for a top surface, where the {111} facetsmeet along the length of the fin. Consequently, the available contactarea between the S/D contact and the diamond shaped S/D epitaxialstructure is limited by the width of the edge-like structure.

One way to increase the available contact area between the S/D contactand the diamond shaped S/D epitaxial structure is to over-etch the topsurface of the diamond shaped S/D epitaxial structure when forming theS/D opening. This allows the S/D contact to be formed “deeper” into theS/D epitaxial structure, effectively increasing the contact area.However, this approach has disadvantages. For example, over-etching cancompromise the stress induced to the channel region by the S/D epitaxialstructure and negatively impact the transistor's performance. Further,over-etching may suffer from process variation due to loading effects orother structure related issues, such as height variation between the S/Depitaxial structures. As a result, some of the S/D contacts may beshallower than others. Therefore, the contact area between the bottom ofthe S/D contacts and the top surface of the S/D epitaxial layers maysubstantially vary across the transistors.

To address these challenges, the embodiments described herein aredirected to forming S/D epitaxial structures with enlarged top surfacewhich increases the effective contact area between the S/D contact andthe S/D epitaxial structure. In some embodiments, a polycrystalline oramorphous layer having a thickness between about 3 nm and about 5 nm canbe introduced to inhibit the diamond-like growth of the S/D epitaxialstructure and to promote the formation of bulk-like shape that includesan enlarged top surface. In some embodiments, more than onepolycrystalline or amorphous layers can be introduced during the S/Depitaxial layer growth. The S/D epitaxial structures described hereincan be suitable for both p-type FETs (PFETs) and n-type FETs (NFETs).The S/D epitaxial structures formed with the methods described hereincan induce additional stress to the transistor's channel region comparedto conventional diamond-shaped S/D epitaxial structures, in which suchadditional stress improves transistor performance. In some embodiments,the polycrystalline or amorphous layer for S/D epitaxial structures usedin PFETs can include boron-doped (B-doped) silicon-germanium (SiGe),B-doped germanium (Ge), B-doped germanium-tin (GeSn), or combinationsthereof. The polycrystalline or amorphous layer for S/D epitaxialstructures used in NFETs can include arsenic (As) or phosphorous(P)-doped silicon (Si), carbon-doped silicon (Si:C), or combinationsthereof.

FIG. 1 is an isometric view of a three-fin FET structure 100 featuringS/D epitaxial structures 110 with an enlarged top surface 110 _(T),according to the embodiments described herein. S/D epitaxial structures110 are formed on recessed portions of fins 120, which are in turnformed in contact with substrate 130. Fins 120 are isolated from eachother via an isolation layer 140. FinFET structure 100 further includesa gate stack 150 formed over non-recessed portions of fins 120 so thatS/D epitaxial structures 110, when formed, are abutting the sidewalls ofgate stack 150. In some embodiments, S/D contacts can be formed on topsurfaces 110 _(T) of S/D epitaxial structures 110. S/D contacts are notshown in FIG. 1 for simplicity.

In some embodiments, S/D epitaxial structures 110 include two or moreepitaxially-grown layers and one or more polycrystalline or amorphouslayers responsible for the shape of S/D epitaxial structures 110 and theformation of the enlarged top surface 110 _(T). These layers are notshown in FIG. 1 for simplicity. In some embodiments, the aforementionedpolycrystalline or amorphous layers inhibit the facet formation duringthe growth of S/D epitaxial structure 110. S/D epitaxial structures 110can develop a more rounded profile and enlarged top surface 110 _(T)compared to the diamond shaped S/D epitaxial structures formed withoutthe use of one or more polycrystalline or amorphous layers.

As discussed earlier, S/D epitaxial structures 110 are formed onrecessed portions of fins 120 not covered by gate stack 150. During theinitial stages of the epitaxial growth, the S/D epitaxial layers of S/Depitaxial structures 110 are confined by fin spacer structures 160.Hence, a bottom portion 110 _(B) of S/D epitaxial structures 110 isgrown upwards with the lateral growth being bounded by fin spacerstructures 160. In some embodiments, fin spacer structures 160 areformed prior to recessing fins 120 and have a height 160H that rangesbetween about 10 nm and about 18 nm. In some embodiments, fins 120 arerecessed below the top surface of isolation layer 140 by a recess amount120 _(R) ranging between about 5 nm and about 10 nm.

Once the S/D epitaxial layers are grown beyond the confinement on finspacer structures 160, lateral growth (e.g., along the x-axis) resumesas shown in FIG. 1 . In some embodiments, height 11 OH of S/D epitaxialstructures 110 ranges from about 90 nm to about 95 nm, and width 100 wof S/D epitaxial structures 110 ranges from about 25 nm to about 32 nm.Width 110 _(BW) of bottom portion 110 _(B) of S/D structure 110 rangesfrom about 5 nm to about 10 nm.

Fins 120 may be formed via patterning by any suitable method. Forexample, fins 120 may be patterned using one or more photolithographyprocesses, including double-patterning or multi-patterning processes.Double-patterning or multi-patterning processes can combinephotolithography and self-aligned processes, allowing patterns to becreated that have, for example, pitches smaller than what is otherwiseobtainable using a single, direct photolithography process. For example,in some embodiments, a sacrificial layer is formed over a substrate andpatterned using a photolithography process. Spacers are formed alongsidethe patterned sacrificial layer using a self-aligned process. Thesacrificial layer is then removed, and the remaining spacers may then beused to pattern the fins.

In some embodiments, fins 120 may be formed from the same material assubstrate 130. However, this is not limiting. By way of example and notlimitation, fins 120 and substrate 130 can include (i) crystalline Si;(ii) Ge; (iii) a compound semiconductor including silicon carbide,gallium arsenide (GaAs), gallium phosphide (GaP), indium phosphide(InP), indium arsenide (InAs), and/or indium antimonide (InSb); (iv) analloy semiconductor including SiGe, gallium arsenide phosphide (GaAsP),aluminum indium arsenide (AlInAs), aluminum gallium arsenide (AlGaAs),gallium indium arsenide (GaInAs), gallium indium phosphide (GaInP),and/or gallium indium arsenide phosphide (GaInAsP); or (v) anycombinations thereof. Substrate 130 and fins 120 are described in FIG. 1, and in subsequent figures, in the context of crystalline Si. Based onthe disclosure herein, other materials, as discussed above, can be used.These materials are within the spirit and scope of this disclosure.

In FIG. 1 , gate stack 150 can include additional layers, such as a gatedielectric stack 150 _(A), work function stack 150 _(B), and metal fill150 _(C). Further, the sidewalls of gate stack 150 are covered by gatespacers 170. Gate spacers 170 are interposed between the sidewalls ofgate stack 150 and S/D epitaxial structures 110. In some embodiments,gate spacers 170 include one or more layers of dielectric material thatisolates gate stack 150 from S/D epitaxial structures 110. Fins 120 canhave non-recessed portions (not visible in FIG. 1 ) covered by gatestack 150.

According to some embodiments, FIG. 2 is a flow chart of a method 200that describes the fabrication process of S/D epitaxial structures 110shown in FIG. 1 . Other fabrication operations may be performed betweenthe various operations of method 200 and may be omitted merely forclarity. Further, the fabrication operations of method 200 are notunique and alternative operations may be performed in place of theoperations in method 200. Embodiments of the present disclosure are notlimited to method 200. Exemplary method 200 will be described withrespect to FIGS. 3A-D and 4A-C.

Referring to FIG. 2 , method 200 begins with operation 210 and theprocess of forming fins on a substrate. The fins are spaced apart by anisolation layer that covers a bottom portion of the fins. By way ofexample and not limitation, the structure described in operation 210 canbe similar to the structure shown in FIG. 3A. In some embodiments, FIG.3A is a cross-sectional view of a precursor structure of three-finFETstructure 100 shown in FIG. 1 along cut line AB. For ease ofdescription, common elements between FIG. 1 and the subsequent figureswill share the same reference numerals. In FIG. 3A, fins 120 andisolation layer 140 formed on substrate 130 correspond respectively tothe fins, the isolation layer, and the substrate as described inoperation 210.

Fins 120 may be patterned using one or more photolithography processes,including double-patterning or multi-patterning processes.Double-patterning or multi-patterning processes can combinephotolithography and self-aligned processes, allowing patterns to becreated that have, for example, pitches smaller than what is otherwiseobtainable using a single, direct photolithography process. In someembodiments, a sacrificial layer (not shown in FIG. 1 ) can be formedover substrate 130 and patterned using a photolithography process.Spacers (not shown in FIG. 1 ) are formed alongside the patternedsacrificial layer using a self-aligned process. The sacrificial layer isthen removed, and the remaining spacers may then be used to pattern thefins.

Once fins 120 are formed, isolation layer 140 can be deposited on fins120 and substrate 130, planarized, and subsequently recessed withrespect to fins 120 using an isotropic etching process as shown in FIG.3A. In some embodiments, and after the aforementioned recess operation,fin 120 has a height 120 _(H) above recessed isolation layer 140 betweenabout 30 nm and about 35 nm. Further, fin 120 has a width 120 _(W)between about 3.5 nm and 5 nm.

Referring to FIG. 2 , method 200 continues with operation 220 and theprocess of forming fin spacer structures 160 on each fin 120 as shown inFIG. 1 . By way of example and not limitation, fin spacer structures 160can be formed as follows. Referring to FIG. 3A, fin spacer material 160′is deposited on fins 120 and isolation layer 140. Subsequently, finspacer material 160′ is etched using an anisotropic etching process toremove fin spacer material 160′ faster on horizontal surfaces (e.g., thetop surfaces of fins 120 and isolation layer 140) than on verticalsurfaces (e.g., the sidewalls of fins 120). As a result, referring toFIG. 3B, the remaining fin spacer material 160′ on the sidewalls of fins120 forms fin spacer structures 160. By way of example and notlimitation, the thickness of fin spacer structures 160 is less than thatof the as-deposited fin spacer material 160′ due to the nature of theanisotropic etching process. In some embodiments, the thickness of finspacer structures 160 ranges between about 3 nm and 5 nm. By way ofexample and not limitation, fin spacer material 160′ can include anitride (e.g., silicon nitride, silicon carbon nitride, siliconoxy-nitride, etc.) that can be selectively etched with respect to fins120 (e.g., silicon) and isolation layer 140 (e.g., a silicon oxide baseddielectric).

Referring to FIG. 2 , method 200 continues with operation 230 and theprocess of etching fins 120 between fin spacer structures 160 to recessfins 120 with respect to isolation layer 140 as shown in FIG. 3C andsimilarly in FIG. 1 . In some embodiments, the portion of fins 120covered by gate stack 150 and gate spacers 170 shown in FIG. 1 is notrecessed. In some embodiments, the etching chemistry used for recessingfins 120 not covered by gate stack 150 and gate spacers 170 includeschlorine-based or fluorine-based gases which can selectively etchsilicon as opposed to nitrides or oxides. As discussed earlier, fins 120are recessed below the top surface of isolation layer 140 by an amount120 _(R) that can range from about 5 nm to about 10 nm. Once fins 120are recessed according to operation 230, an opening 300 is formedbetween fin spacer structures 160 as shown in FIG. 3C. Dashed line 310corresponds to the un-recessed portion of the fin covered by gate stack150 and gate spacers 170 shown in FIG. 1 .

Referring to FIG. 2 , method 200 continues with operation 240 and theprocess of growing a first epitaxial layer on recessed fins 120 betweenfin spacer structures 160. According to some embodiments, the portion ofthe first epitaxial layer surrounded by fin spacer structures 160 is“forced” to a vertical growth (e.g., a growth along the z-axis and nolateral growth along the x-axis) as shown in FIG. 3D. The portion of thefirst epitaxial layer between fin spacer structures 160 corresponds tothe bottom portion 110B of S/D epitaxial structure 110 shown in FIG. 1 .As the first epitaxial layer grows thicker than the height of fin spacerstructures 160, the lateral growth (e.g., along the x-axis) resumes andthe first epitaxial layer assumes the shape of a diamond 110 _(C) asshown in FIG. 4A. The resulting diamond 110 _(C) features facets 400which are parallel to silicon crystalline planes {111}. In someembodiments, the shape of diamond 110 _(C) is the result of a lowergrowth rate observed for the first epitaxial layer in a directionperpendicular to silicon crystalline planes {111} as compared to adirection perpendicular to silicon crystalline planes {100} (e.g., alongthe z-axis) and silicon crystalline planes {110} (along the x-axis). Ifthe first epitaxial layer is allowed to grow further, the size ofdiamond 110 _(C) will further increase. By way of example and notlimitation, the width to height ratio (110 _(CW)/110 _(CH)) of diamond110 _(C) can be about 1.4 and due to the slower growth in the directionperpendicular to silicon crystalline planes {111}, an angle θ betweenabout 70° and 1200 is formed between facets 400.

Diamond 110 _(C), in contrast to S/D epitaxial structures 110, has a topsurface 110 _(CT) formed by two adjoining facets 400. Top surface 100_(CT) provides limited surface area compared to S/D epitaxial structures110. Further, top surface 100 _(CT) does not substantially increase asthe first epitaxial layer grows. Therefore, if an S/D contact were to beformed on diamond 100 _(C) of first epitaxial layer, the limited“landing” area of top surface 100 _(CT) would result in a high S/Dcontact resistance as discussed earlier.

In some embodiments, the first epitaxial layer can include strained Sidoped with C (Si:C), Si doped with P (Si:P), or Si doped with As (Si:As)for n-type finFETs. Respectively, the first epitaxial layer can includestrained SiGe doped with B, Ge doped with B, or GeSn doped with B. Byway of example and not limitation, the amount of P incorporated into thefirst epitaxial layer for n-type finFETs can be about 3×10²¹ atoms/cm⁻³and the amount of B incorporated into the first epitaxial layer forp-type finFETs can be about 1×10²¹ atoms/cm⁻³. In some embodiments, Pand B dopants can be incorporated into the first epitaxial layer duringgrowth. By way of example and not limitation, the concentration of C inSi:C can be equal to or less than about 5 atomic % (at. %), andrespectively the concentration of Ge in SiGe can be between about 20 at.% and about 40 at. %. Further, the concentration of Sn in GeSn can bebetween about 5 at. % and about 10 at. %. The aforementioned dopant andatomic concentrations are exemplary and not intended to be limiting.Therefore, different dopant and atomic concentrations are within thespirit and the scope of the embodiments described herein.

The first epitaxial layer may be grown, for example, by sequentialdeposition and etching operations to produce a crystalline layer havingthe diamond shape shown in FIG. 4A. By way of example and notlimitation, first epitaxial layer can be deposited by chemical vapordeposition (CVD) at temperatures of about 680° C. for Si:P and Si:As,between about 600° C. and about 700° C. for Si:C, about 620° C. forSiGe, between about 300° C. and about 400° C. for GeSn, and betweenabout 500° C. and about 600° C. for Ge.

In some embodiments, first epitaxial layer of operation 240 may includeone or more layers with different dopant concentrations and/or differentatomic concentrations. Therefore, the term “first epitaxial layer” asused herein may apply to one or more crystalline layers formedsequentially with different dopant and/or atomic concentrations.

Referring to FIG. 2 , method 200 continues with operation 250 and theprocess of depositing an amorphous or polycrystalline layer on thesurfaces of the first epitaxial layer not covered by fin spacerstructures 160. In some embodiments, the purpose of the amorphous orpolycrystalline layer is to provide a non-crystalline foundation thatallows a subsequently formed crystalline layer to grow substantially“facet-free” with an angle θ greater than about 55°. In other words, theamorphous or polycrystalline layer eliminates the growth rate differencebetween the different facets and allows the growth of a substantiallyfacet-free epitaxial layer. In some embodiments, FIG. 4B shows theresulting structure where amorphous or polycrystalline layer 110 _(A) isdeposited on exposed surfaces of the first epitaxial layer.

In some embodiments, amorphous or polycrystalline layer 110 _(A) isdeposited at a thickness between about 1 nm and about 5 nm. Atthicknesses below about 1 nm, amorphous or polycrystalline layer 110_(A) may not be thick enough to eliminate the growth rate differencebetween the different facets and allow the growth of a substantiallyfacet-free epitaxial layer. In other words, for amorphous orpolycrystalline layer thinner than about 1 nm, the subsequently formedsecond epitaxial layer may continue to form facets like the firstepitaxial layer. On the other hand, thicknesses greater than about 5 nmmay compromise the stress induced to the channel region by the first andsecond epitaxial layers of the S/D epitaxial structure. In someembodiments, the thickness of amorphous or polycrystalline layer 110_(A) is different on the upper facets 400 of diamond 110 _(C) comparedto the lower facets 400. In some embodiments, the thickness of amorphousor polycrystalline layer 110 _(A) on the lower facets of diamond 110_(C) can range from about 2 nm to about 5 nm.

In some embodiments, amorphous or polycrystalline layer 110 _(A)includes the same materials included in the first epitaxial layer. Forexample, if the first epitaxial layer includes Si:C, Si:P, or Si:As,then amorphous or polycrystalline layer 110 _(A) respectively includesSi:C, Si:P, Si:As. If the first epitaxial layer includes SiGe, Ge, orGeSn, then amorphous or polycrystalline layer 110 _(A) respectivelyincludes SiGe, Ge, or GeSn. In some embodiments, the dopantconcentration between the first epitaxial layer and amorphous orpolycrystalline layer 110 _(A) can be different. For example, amorphousor polycrystalline layer 110 _(A) may include a higher dopantconcentration for P or B. By way of example and not limitation, for aSi:P amorphous or polycrystalline layer 110 _(A), the P dopantconcentration can be about 5×10²¹ atoms/cm³ as opposed to about 3×10²¹atoms/cm³ for the first epitaxial layer. For a SiGe amorphous orpolycrystalline layer 110 _(A), the B dopant concentration can begreater than about 3×10²¹ atoms/cm³ as opposed to about 1×10²¹ atoms/cm³for the first epitaxial layer.

In some embodiments, amorphous or polycrystalline layer 110 _(A) isgrown in-situ with the first epitaxial layer using the same precursorsand reactant gases. In some embodiments, amorphous or polycrystallinelayer 110 _(A) is grown at a lower temperature and higher processpressure than that of the first epitaxial layer. More specifically,amorphous layers can be grown at lower temperatures and higher processpressures than polycrystalline layers, and polycrystalline layers can begrown at lower temperatures and higher process pressures thancrystalline epitaxial layers. In other words, the deposition temperaturefor amorphous, polycrystalline, and crystalline epitaxial layers followsthe trend below:T _(amorphous) <T _(polycrystalline) <T _(crystalline)and the process pressure for amorphous, polycrystalline, and crystallineepitaxial layers follows the trend below:P _(amorphous) >P _(polycrystalline) >P _(crystalline)

By way of example and not limitation, if the deposition temperature of acrystalline GeSn layer is between about 300° C. and 400° C.,polycrystalline GeSn can be deposited at temperatures between about 200°C. and 300° C., and amorphous GeSn can be deposited below 200° C.Likewise, if the deposition temperature for crystalline Si:C is betweenabout 600° C. and 750° C. and the process pressure between about 20 Torrand about 200 Torr, polycrystalline Si:C can be deposited between about550° C. and 600° C. at a process pressure between about 200 Torr andabout 300 Torr, and amorphous Si:C can be deposited below 550° C. at aprocess pressure above about 300 Torr. In some embodiments, thedeposition temperature is sufficient to modulate the crystallinemicrostructure of the deposited layer. In some embodiments, otherprocess parameters, such as precursor/reactant gas flow ratios, can beused to modulate other physical properties of the deposited layers suchas the stoichiometry and/or the density. In some embodiments, thecrystalline, polycrystalline, and amorphous layers described herein aregrown with a rapid thermal chemical vapor deposition (RTCVD) processthat allows rapid deposition temperature changes (e.g., within about 10s to about 20 s) so that layers with desired crystalline microstructurecan be grown in-situ—for example, without a vacuum break betweendepositions.

Referring to FIG. 2 , method 200 continues with operation 260 and theprocess of growing a second epitaxial layer on amorphous orpolycrystalline layer 110 _(A). In some embodiments, FIG. 4C shows theresulting structure, where second epitaxial layer 110 _(D) is grown onamorphous or polycrystalline layer 110 _(A). In some embodiments, secondepitaxial layer 110 _(D) is a crystalline layer similar to the firstpolycrystalline layer that forms diamond 110 _(C). In some embodiments,second epitaxial layer 110 _(D) and first epitaxial layer have differentGe concentrations, Sn concentration, and/or C concentrations to inducedifferent amounts of stress in the channel region. For example, inPFETs, higher strain is achieved with higher Sn or Ge concentrations—forexample, for Sn or Ge concentrations between about 5% and 10%, orhigher. Accordingly, higher C concentrations increase the amount ofstress induced in the channel region for NFETs.

In some embodiments, the first epitaxial layer, amorphous orpolycrystalline layer 110 _(A), and second epitaxial layer 110 _(D)collectively form S/D epitaxial structure 110 shown in FIGS. 1 and 4C.In some embodiments, due to the presence of amorphous or polycrystallinelayer 110 _(A), second epitaxial layer 110 _(D) is grown so that S/Depitaxial structure 110 develops an enlarged top surface 110 _(T) havinga width along the x-direction. By way of example and not limitation, thewidth of top surface 110 _(T) can be grown to be between about 1 andabout 1.5 times width 110 _(CW) of diamond 110 _(C).

In some embodiments, the width of top surface 110 _(T) can be about 3 to4 times larger than the top surface of a similarly sized, diamond shapedS/D epitaxial structure. For example, assuming that a diamond shaped S/Depitaxial structure, like diamond 110 _(C), is allowed to grow to a sizesimilar to S/D epitaxial structure 110, a ratio between 110 _(T) and 110_(CT) can be between about 3 and about 4 (e.g., 3≤110 _(T)/110 _(CT)≤4).In some embodiments, a ratio between 110 _(T) and 110 _(CW) is betweenabout 1 and about 1.5 (e.g., 1≤110 _(T)/110 _(CW)≤1.5). Consequently,S/D epitaxial structure 110 provides a large surface area between theS/D epitaxial structure and a subsequently formed S/D contact structure.

Due to the presence of amorphous or polycrystalline layer 110 _(A), S/Depitaxial layer 110 _(D) is grown with less pronounced facets andfeatures a more rounded shape compared to a diamond shaped S/D epitaxialstructure. S/D epitaxial structure 110 may be referred to as“substantially facet-free” S/D epitaxial structure.

In some embodiments, additional stress can be induced to the channelregion formed within fin 120 covered by gate stack 150 shown in FIG. 1as a result of the substantially facet-free shape of the S/D epitaxialstructure 110. For example, the stress improvement can range betweenabout 0.1 GPa and about 0.6 GPa. In some embodiments, the aforementionedstress improvement corresponds to a stress induced to a top portion ofun-recessed fin 120 covered by gate stack 150 as shown in FIG. 1 .

In some embodiments, variations of method 200 are possible. For example,in such a variation, during operation 240 shown in FIG. 2 , bottomportion 110 _(B) is not permitted to grow higher than fin spacerstructures 160 as shown in FIG. 5A. For example, the growth of bottomportion 110 _(B) is terminated when bottom portion 110 _(B) reaches thetop surface of fin spacer structures 160. Subsequently, in operation250, amorphous or polycrystalline layer 110 _(A) is formed on a topsurface of bottom portion 110 _(B) instead of diamond 110 _(C) shown inFIG. 4B. As a result, amorphous or polycrystalline layer 110 _(A) willgrow to a rounded shape as shown in FIG. 5A.

In subsequent operation 260, second epitaxial layer 110 _(D) is grown onamorphous or polycrystalline layer 110 _(A). Second epitaxial layer 110_(D) can be grown with a more pronounced round profile compared tosecond epitaxial layer 110 _(D) shown in FIG. 4C. Consequently, theresulting S/D epitaxial structure 110′ will be more rounded than S/Depitaxial structure 110 shown in FIG. 4C. In some embodiments, S/Depitaxial structure 110′ has a larger top width 110′_(T) along thex-axis than that of S/D epitaxial structure 110 (e.g., 110′_(T)>110_(T)) by an amount between about 2 nm and about 5 nm. A larger topsurface width 110′_(T) facilitates the formation of the S/D contact andreduces the contact resistance.

In yet another variation of method 200, after forming amorphous orpolycrystalline layer 110 _(A) shown in FIG. 5A, the subsequent secondepitaxial layer 110 _(D) is not allowed to grow to its full thicknessbut instead it is grown thinner as shown in FIG. 6 . In someembodiments, the thickness of epitaxial layer 110 _(D) is limited toless than about 10 nm. Subsequently, a second amorphous orpolycrystalline layer 600 is grown on second epitaxial layer 110 _(D) ata thickness between about 2 nm and about 5 nm. Finally, a thirdepitaxial layer 610 is grown on the second amorphous or polycrystallinelayer 600 to form S/D epitaxial structure 110″ shown in FIG. 6 .

In some embodiments, top surface width 110″_(T) of S/D epitaxialstructure 110″ along the x-direction is larger than that of S/Depitaxial structures 110′ and 110 shown respectively in FIGS. 5B and 4C.In other words, 110″_(T)>110′_(T)>110 _(T). Further, the stress inducedto the channel region by S/D epitaxial structure 110″ can be larger thanthe stress induced by S/D epitaxial structures 110′ and 110 and can alsoextend to a larger area of the channel region. In some embodiments, thestress benefit of S/D epitaxial structure 110″ can be closer to about0.6 GPa. In some embodiments, S/D epitaxial structure 110″ has the leastamount of {111} facets compared to S/D epitaxial structures 110′ and 110shown respectively in FIGS. 4C and 5B due to the increased number of theintervening amorphous or polycrystalline layers 110 _(A) and 600 used inthe formation of S/D epitaxial structure 110″.

Embodiments described herein are directed to forming S/D epitaxialstructures with an enlarged top surface that increases the effectivecontact area between a S/D contact and the S/D epitaxial structure. Insome embodiments, a polycrystalline or amorphous layer having athickness between about 3 nm and about 5 nm can be introduced to inhibitthe diamond-like growth of the S/D epitaxial structure and promote theformation of a S/D epitaxial stack with enlarged top surface. In someembodiments, more than one polycrystalline or amorphous layer can beintroduced during the S/D epitaxial structure formation. The S/Depitaxial structures described herein are suitable for both p-type FETs(PFETs) and n-type FETs (NFETs). Further, S/D epitaxial structures grownwith the method described herein may induce additional stress to thetransistor's channel region compared to conventional diamond-shaped S/Depitaxial structures, in which such additional stress improvestransistor performance. In some embodiments, the polycrystalline oramorphous layer for S/D epitaxial structures used in PFETs can includeB-doped SiGe, B-doped Ge, B-doped GeSn, or combinations thereof.Accordingly, the polycrystalline or amorphous layer for S/D epitaxialstructures used in NFETs can include As- or P-doped Si, Si:C, orcombinations thereof.

In some embodiments, a semiconductor structure includes a substrate witha fin thereon, where the fin comprises a first fin portion shorter thana second fin portion. The semiconductor structure further includes adielectric layer adjacent to the fin, where the dielectric layersurrounds a bottom portion of the second fin portion and sidewalls ofthe first fin portion and is taller than the first fin portion. Thesemiconductor structure also includes a gate stack on the second finportion not covered by the dielectric layer and an epitaxial stack grownon a top surface of the first fin portion, wherein the epitaxial stackabuts the gate stack and includes a first crystalline epitaxial layercomprising facets; a non-crystalline epitaxial layer on the firstcrystalline layer; and a second crystalline epitaxial layer on the anon-crystalline epitaxial layer, where the second crystalline epitaxiallayer is substantially facet-free.

In some embodiments, a method includes forming spaced apart fins on asubstrate; forming a dielectric layer on the substrate to surround abottom portion of the fins; forming a gate stack over the fins; formingspacers on sidewall surfaces of the fins not covered by the gate stack;etching portions of the fins not covered by the gate stack to recess thefins with respect to the spacers and the dielectric layer: growing afirst epitaxial layer on top surfaces of the etched fins between thespacers; growing a second epitaxial layer on surfaces of the firstepitaxial layer not covered by the spacers, where the second epitaxiallayer has a different crystalline microstructure from the firstepitaxial layer and is substantially facet-free. The method furtherincludes growing a third epitaxial layer on the second epitaxial layer,where the third epitaxial layer is substantially facet-free and has asimilar crystalline microstructure as the first epitaxial layer.

In some embodiments, a method includes forming spaced apart fins on asubstrate; forming a dielectric layer on the substrate to surround abottom portion of the fins; forming a gate stack over the fins; formingspacers on sidewall surfaces of the fins not covered by the gate stack;etching portions of the fins not covered by the gate stack to recess thefins with respect to the spacers and the dielectric layer. The methodfurther includes forming a source/drain epitaxial stack on etchedportions of the fins, where forming the source/drain epitaxial stackincludes growing a first epitaxial layer on the etched fins, growing asecond epitaxial layer on surfaces of the first epitaxial layer at alower temperature than that of the first epitaxial layer, and growing athird epitaxial layer on surfaces of the second epitaxial layer at ahigher temperature than that of the second epitaxial layer.

It is to be appreciated that the Detailed Description section, and notthe Abstract of the Disclosure section, is intended to be used tointerpret the claims. The Abstract of the Disclosure section may setforth one or more but not all possible embodiments of the presentdisclosure as contemplated by the inventor(s), and thus, are notintended to limit the subjoined claims in any way.

The foregoing disclosure outlines features of several embodiments sothat those skilled in the art may better understand the aspects of thepresent disclosure. Those skilled in the art will appreciate that theymay readily use the present disclosure as a basis for designing ormodifying other processes and structures for carrying out the samepurposes and/or achieving the same advantages of the embodimentsintroduced herein. Those skilled in the art will also realize that suchequivalent constructions do not depart from the spirit and scope of thepresent disclosure, and that they may make various changes,substitutions, and alterations herein without departing from the spiritand scope of the present disclosure.

What is claimed is:
 1. A method, comprising: forming spaced apart finson a substrate; forming a dielectric layer on the substrate to surrounda bottom portion of the fins; forming a gate stack over the fins;forming spacers on sidewall surfaces of the fins not covered by the gatestack; etching portions of the fins not covered by the gate stack torecess the fins with respect to the spacers and the dielectric layer;growing a first epitaxial layer on top surfaces of the etched finsbetween the spacers; forming an amorphous or polycrystalline layer onthe first epitaxial layer; growing a second epitaxial layer on theamorphous or polycrystalline layer, wherein the second epitaxial layeris substantially facet-free.
 2. The method of claim 1, wherein formingthe amorphous or polycrystalline layer comprises depositing asemiconductor material of the first epitaxial layer.
 3. The method ofclaim 1, wherein growing the first and second epitaxial layers comprisesdepositing boron-doped (B-doped) silicon-germanium (Site), B-dopedgermanium (Ge), B-doped germanium-tin (GeSn), or combinations thereof.4. The method of claim 1, wherein growing the first and second epitaxiallayers comprises depositing arsenic (As) doped or phosphorous (P) dopedsilicon (Si), carbon-doped silicon (Si:C), or combinations thereof. 5.The method of claim 1, wherein forming the amorphous or polycrystallinelayer comprises growing the amorphous or polycrystalline layer at alower deposition temperature than that of the first epitaxial layer. 6.The method of claim 1, wherein growing the second epitaxial layersubstantially facet-free comprises growing the second epitaxial layerhaving a rounded shape.
 7. A method, comprising: forming spaced apartfins on a substrate; forming a dielectric layer on the substrate tosurround a bottom portion of the fins; forming a gate stack over thefins; forming spacers on sidewall surfaces of the fins not covered bythe gate stack; etching portions of the fins not covered by the gatestack to recess the fins with respect to the spacers and the dielectriclayer; and forming a source/drain epitaxial stack on etched portions ofthe fins, wherein forming the source/drain epitaxial stack comprises:growing a first epitaxial layer on the etched fins; forming an amorphousor polycrystalline layer on the first epitaxial layer; and growing asecond epitaxial layer on the amorphous or polycrystalline layer.
 8. Themethod of claim 7, wherein growing the second epitaxial layer comprisesgrowing the second epitaxial layer with a crystalline microstructure. 9.The method of claim 7, wherein growing the second epitaxial layercomprises growing the second epitaxial layer substantially facet-free.10. A method, comprising: forming a fin on a substrate; forming asource/drain (S/D) structure on the fin, wherein forming the S/Dstructure comprises: forming a first epitaxial layer with facets and adiamond shape profile on the fin; forming an amorphous orpolycrystalline layer over the first epitaxial layer; forming a secondepitaxial layer with a substantially facet-free rounded profile on theamorphous or polycrystalline layer; and forming a gate stack on the finand adjacent to the S/D structure.
 11. The method of claim 10, whereinforming the first epitaxial layer comprises forming the diamond shapeprofile with facets parallel to {111} silicon crystal planes.
 12. Themethod of claim 10, wherein forming the amorphous or polycrystallinelayer comprises depositing an amorphous or polycrystalline layer with athickness of about 1 nm to about 5 nm.
 13. The method of claim 10,wherein forming the amorphous or polycrystalline layer comprisesdepositing a semiconductor material of the first epitaxial layer. 14.The method of claim 10, wherein forming the second epitaxial layercomprises forming a crystalline epitaxial layer with the substantiallyfacet-free rounded profile.
 15. The method of claim 10, wherein formingthe first epitaxial layer comprises forming a crystalline layer at afirst temperature, and wherein forming the amorphous or polycrystallinelayer comprises forming a non-crystalline layer at a second temperaturethat is lower than the first temperature.
 16. The method of claim 10,wherein forming the second epitaxial layer comprises forming asemiconductor layer with a crystalline microstructure that is similar toa crystalline microstructure of the first epitaxial layer.
 17. Themethod of claim 10, wherein the first epitaxial layer is formed in-situwith the second epitaxial layer.
 18. The method of claim 10, wherein thefirst and second epitaxial layers are formed with differentconcentrations of germanium.
 19. The method of claim 10, wherein thesecond epitaxial layer is formed with a top surface that is about 1 toabout 1.5 times wider than a width of the first epitaxial layer.
 20. Themethod of claim 10, wherein forming the second epitaxial layer comprisesdepositing the second epitaxial layer over all facets of the firstepitaxial layer.